Development and Implementation of a Rotating Nanoimprint Lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

Abstract Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect nanoimprint lithography (NIL). This study describes the development NIL tool its integration into nanopositioning nanomeasuring machine to achieve high-precision orthogonal for soft ultraviolet-assisted (soft UV-NIL). The process was implemented primarily edges plano-convex substrates demonstrate structure uniformity edges. High-resolution nanostructures sub-200-nm lateral dimension microstructures in range tens microns were imprinted. However, large, difficult characterize precisely. Therefore, used measure fidelity characterized using profilometry, white light interferometry, confocal laser scanning microscopy. Regardless restricted imaging capabilities at high inclinations high-resolution nanostructures, electron microscope (SEM) top lens substrate an inclination 45° performed. micro successfully imprinted angles 45°, 60°,and 90° from center rotation rotating tool. method enables precise imprinting inclinations, thereby presenting different approach UV-NIL surfaces.